Editor(s):
(1) Dr. Anthony R. Lupo, University of Missouri, USA.
Reviewers:
(1) Neha Bansal, SRM Institute Of Science And Technology, India.
(2) Nikolaos Koukouzas, Centre For Research And Technology-Hellas (CERTH), Greece.
Additional Reviewers:
Open Peer Review Policy: Click Here
Specific Comment:
Average Peer review marks at initial stage: 7/10
Average Peer review marks at publication stage: 8.5/10
Peer Review History:
Stage 1 | Original Manuscript | File 1 | NA
Stage 2 | Peer review report_1 (Neha Bansal, India) | File 1 | NA
Stage 2 | Peer review report_2 (Nikolaos Koukouzas, Greece) | File 1 | NA
Stage 2 | Revised_MS_v1_and_Feedback_v1 | File 1 | File 2
Stage 3 | Comment_Editor_1_v1 | File 1 | NA