Peer Review History: A Review: Application of Cold Plasma in Food Processing Industry

Editor(s):

(1) Prof. Chen Chin Chang, Tainan University of Technology, Taiwan.

Reviewers:

(1) Ali Anvari, University of Missouri, United States.

(2) Khaled Hamed El-Shorbagy, Egypt.

Additional Reviewers:

(1) Sikha Bhaduri, USA.

Additional Reviewers: (Comments received after deadline)

(1) K. Meera Sankarankutty, S.N.D.T Womens University, India.

(2) Sushma Rani Thiyyagura, India.

Open Peer Review Policy: Click Here

Specific Comment:

Average Peer review marks at initial stage: 8.95/10

Average Peer review marks at publication stage: 9/10

Peer Review History:


Stage 1 | Original Manuscript | File 1 | NA


Stage 2 | Peer Review Report_1 (Ali Anvari, United States) | File 1 | NA


Stage 2 | Peer Review Report_2 (Khaled Hamed El-Shorbagy, Egypt) | File 1 | NA


Stage 2 | Revised_MS_v1_and_Feedback_v1 | File 1 | File 2


Stage 3 | Comment_Editor_1_v1 | File 1 | NA


Stage 3 | Revised_MS_v2_and_Feedback_v2 | File 1 | NA


Posted in Review History.